Axcelis Launches GSD Ovation™ ES Ion Implanter for Advanced Engineered Substrate Applications

Axcelis Technologies, Inc., a leading supplier of enabling ion implantation solutions for the semiconductor industry, has announced the launch of the Company's GSD Ovation™ ES high current ion implanter, targeted specifically for engineered substrates. 

Executive Vice President Dr. Greg Redinbo, commented, "We're excited to introduce the GSD Ovation ES. The GSD Ovation ES enables best-in-class high current Hydrogen & Helium implant capability for engineered substrate applications, including wafer splitting. The system is an evolution of the GSD Ovation Series platform, the industry benchmark for batch implanter productivity."

The GSD Ovation ES system delivers superior flexibility and capital efficiency. It provides production-proven wafer handling capability for multiple substrate types, including SiC, LiTaO3, LiNbO3, in a wide range of thickness and weights. It also offers superior beam power and wafer cooling capability. The system is available today with factory demo capability to meet customer application needs.